资源类型

期刊论文 64

会议视频 2

年份

2024 1

2023 5

2022 6

2021 1

2020 4

2019 7

2018 2

2017 1

2016 2

2015 3

2014 2

2013 1

2012 2

2011 4

2010 6

2009 5

2008 9

2007 5

展开 ︾

关键词

2021全球十大工程成就 2

185 nmUV 1

X射线自由电子激光 1

[BMIm]PF6 1

[C6MIm]PF6 1

[PMIm]PF6 1

三维适形放疗 1

二苯甲酮 1

分子荧光光谱 1

动力学 1

医院中子照射器 1

半滑舌鳎 1

天然溶解有机质 1

孔雀石绿 1

学术创新 1

工艺流程 1

循环水养殖系统 1

微波辐射 1

昆虫不育 1

展开 ︾

检索范围:

排序: 展示方式:

Effect of ultraviolet irradiation and chlorination on ampicillin-resistant

Yuchen PANG,Jingjing HUANG,Jinying XI,Hongying HU,Yun ZHU

《环境科学与工程前沿(英文)》 2016年 第10卷 第3期   页码 522-530 doi: 10.1007/s11783-015-0779-9

摘要: Antibiotic resistance is a serious public health risk that may spread via potable and reclaimed water. Effective disinfection is important for inactivation of antibiotic-resistant bacteria and disruption of antibiotic resistance genes. Ampicillin is a widely prescribed antibiotic but its effectiveness is increasingly undermined by resistance. In this study, changes in ampicillin resistance for ( ) CGMCC 1.1595 were analyzed after exposure to different doses of ultraviolet (UV) or chlorine, and damage incurred by the plasmid encoding ampicillin resistance gene was assessed. We reported a greater stability in ampicillin-resistant CGMCC 1.1595 after UV irradiation or chlorination when compared with previously published data for other strains. UV irradiation and chlorination led to a shift in the mortality frequency distributions of ampicillin-resistant when subsequently exposed to ampicillin. The ampicillin hemi-inhibitory concentration (IC ) without disinfection was 3800 mg·L , and an increment was observed after UV irradiation or chlorination. The IC of ampicillin-resistant was 1.5-fold higher at a UV dose of 40 mJ·cm , and was 1.4-fold higher when exposed to 2.0 mg·L chlorine. These results indicate that UV irradiation and chlorination can potentially increase the risk of selection for strains with high ampicillin resistance. There was no evident damage to after 1–10 mg Cl ·L chlorination, while a UV dose of 80 mJ·cm yielded a damage ratio for of approximately 1.2-log. Therefore, high UV doses are required for effective disruption of antibiotic resistance genes in bacteria.

关键词: antibiotic resistance     Escherichia coli     ampicillin resistance gene     ultraviolet irradiation     chlorination    

Decomposition of aqueous chlorinated contaminants by UV irradiation with H

Eunsung KAN,Chang-Il KOH,Kyunghyuk LEE,Joonwun KANG

《环境科学与工程前沿(英文)》 2015年 第9卷 第3期   页码 429-435 doi: 10.1007/s11783-014-0677-6

摘要: In the present study, the decomposition rates of carbon tetrachloride (CCl ) and 2,4-dichlorophenol (2,4-DCP) in water by the ultraviolet (UV) light irradiation alone and H O /UV were experimentally investigated. The detailed experimental studies have been conducted for examining treatment capacities of the two different ultraviolet light sources (low and medium pressure Hg arc) in H O /UV processes. The low or medium UV lamp alone resulted in a 60%–90% decomposition of 2,4-DCP while a slight addition of H O resulted in a drastic enhancement of the 2,4-DCP decomposition rate. The decomposition rate of 2,4-DCP with the medium pressure UV lamp alone was about 3–6 times greater than the low pressure UV lamp alone. In the direct photolysis of aqueous CCl , the medium pressure UV lamp had advantage over the low pressure UV lamp because the molar extinction coefficient of CCl at shorter wavelength (210–220 nm) is about 20 to 50 times higher than that at 254 nm. However, adding H O to the medium pressure UV lamp system rendered a negative oxidation rate because H O acted as a UV absorber being competitive with CCl due to negligible reaction between CCl and OH radicals. The results from the present study indicated significant influence of the photochemical properties of the target contaminants on the photochemical treatment characteristics for designing cost-effective UV-based degradation of toxic contaminants.

关键词: H2O2/ultraviolet (UV) light     advanced oxidation     UV light irradiation     chlorinated contaminants     photochemical treatment characteristics    

Factors influencing the photodegradation of

Bingbing XU, Zhonglin CHEN, Fei QI, Jimin SHEN, Fengchang WU

《环境科学与工程前沿(英文)》 2009年 第3卷 第1期   页码 91-97 doi: 10.1007/S11783-009-0013-8

摘要: In order to provide basic data for practical application,photodegradation experiment of -nitrosodimethylamine (NDMA) in aqueous solution was carried out with a low-pressure Hg lamp. Effects of the initial concentration of NDMA, solution pH, dissolved oxygen, and the presence of humic acid on NDMA photodegradation were investigated. NDMA at various initial concentrations selected in this study was almost completely photodegraded by UV irradiation within 20 min, except that at 1.07 mmol/L, NDMA could be photodegraded almost completely in the acidic and neutral solutions, while the removal efficiency decreased remarkably in the alkaline solution. Dissolved oxygen enhanced the NDMA photodegradation, and the presence of humic acid inhibited the degradation of NDMA. Depending on the initial concentration of NDMA, NDMA photodegradation by UV obeyed the pseudo-first-order kinetics. Dimethylamine, nitrite, and nitrate were detected as the photodegradation products of NDMA. O was found to be the reactive oxygen species present in the NDMA photodegradation process by UV, based on the inhibiting experiments using tert-butanol and sodium azide.

关键词: N-nitrosodimethylamine (NDMA)     ultraviolet irradiation     degradation kinetic     dimethylamine     photodegradation product    

Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

《机械工程前沿(英文)》 2010年 第5卷 第1期   页码 87-92 doi: 10.1007/s11465-009-0078-x

摘要: Ultraviolet (UV) exposure, as an additional technique following the traditional wet chemical activation processes, is applied to enhance hydrophilic silicon direct bonding. The effects of UV exposure on silicon wafers’ nano-topography and bonding strength are studied. It is found that the surface roughness of silicon wafers initially decreases and then increases with UV exposure time, and the bonding strength increases and then decreases accordingly. The correlations of annealing temperature and annealing time vs. bonding strength are experimentally explored. Results indicate that the bonding strength increases sharply then gently with increasing annealing temperature and annealing time using UV exposure. Besides, the reliability of silicon direct bonding with UV exposure enhancement after the high/low temperature cycle test, constant temperature and humidity test, vibration test and shock test is investigated. It follows from the results that the bonding strength of silicon wafer pairs with UV exposure decreases after the environmental tests, whereas the residual strength is still higher than that without UV exposure, and the variation trends of bonding strength vs. UV exposure time, annealing temperature and annealing time remain unchanged. Therefore, following the traditional wet chemical activation processes, appropriate UV exposure (about three minutes in this study) is effective and promising to enhance silicon direct bonding.

关键词: ultraviolet (UV) exposure     silicon direct bonding     bonding strength     reliability    

Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

《机械工程前沿(英文)》 2011年 第6卷 第2期   页码 214-218 doi: 10.1007/s11465-011-0130-5

摘要:

The process of patterned wafer bonding using ultraviolet (UV) adhesive as the intermediate layer was studied. By presetting the UV adhesive guide-layer, controlling the thickness of the intermediate layer (1– 1.5 μm), appropriate pre-drying temperature (60°C), and predrying time (6 min), we obtained the intermediate layer bonding of patterned quartz/quartz. Experimental results indicate that patterned wafer bonding using UV adhesive is achieved under room temperature. The process also has advantages of easy operation, low cost, and no plugging or leakage in the patterned area after bonding. Using the process, a microfluidic chip for red blood cell counting was designed and fabricated. Patterned wafer bonding using UV adhesive will have great potential in the fabrication of microfluidic chips.

关键词: ultraviolet (UV) adhesive     intermediate layer     patterned wafer bonding    

Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

《环境科学与工程前沿(英文)》 2012年 第6卷 第4期   页码 588-594 doi: 10.1007/s11783-012-0433-8

摘要: A conceptual mathematical model was used to evaluate the design parameters of a combined ultraviolet (UV)-biofilter system, and perform a cost analysis. Results showed that the UV light source strength and the gas residence times in the UV system (UVRT) and biofilter (EBRT) had positive effects on the overall chlorobenzene removal efficiency of the system. High ratio of UVRT to EBRT improved the removal efficiency, suggesting that the UV system has a greater effect on the overall performance of the system compared with the biofilter. Analysis of the capital and operating costs showed that the capital costs of the standalone biofilter system were much higher than those of the standalone UV system. However, the biofilter operating costs were lower than those of the UV system. The operating costs of the combined UV-biofilter system increased with increasing UVRT/EBRT ratio, whereas its capital costs decreased.

关键词: volatile organic compounds     ultraviolet (UV) photodegradation     biofilter     modeling     cost analysis    

Toward better understanding vacuum ultraviolet–iodide induced photolysis via hydrogen peroxide formation

《环境科学与工程前沿(英文)》 2022年 第16卷 第5期 doi: 10.1007/s11783-021-1489-0

摘要:

• UV/VUV/I induces substantial H2O2 and IO3 formation, but UV/I does not.

关键词: Vacuum ultraviolet     Hydrogen peroxide     Iodate     Hydroxyl radical     Redox transition    

Use of gamma-irradiation pretreatment for enhancement of anaerobic digestibility of sewage sludge

YUAN Shoujun, ZHENG Zheng, YU Xin, ZHAO Yongfu, MU Yanyan

《环境科学与工程前沿(英文)》 2008年 第2卷 第2期   页码 247-250 doi: 10.1007/s11783-008-0041-9

摘要: The effects of ?-irradiation pretreatment on anaerobic digestibility of sewage sludge was investigated in this paper. Parameters like solid components, soluble components, and biogas production of anaerobic digestion experiment for sewage sludge were measured. The values of these parameters were compared before and after ?-irradiation pretreatment. Total solid (TS), volatile solid (VS), suspended solid (SS), volatile suspended solid (VSS), and average floc size of samples decreased after ?-irradiation treatment. Besides, floc size distribution of sewage sludge shifted from 80–100 ?m to 0–40 ?m after ?-irradiation treatment at the doses from 0 to 30 kGy, which indicated the disintegration of sewage sludge. Moreover, microbe cells of sewage sludge were ruptured by ?-irradiation treatment, which resulted in the release of cytoplasm and increase of soluble chemical oxygen demand (SCOD). Both sludge disintegration and microbe cells rupture enhanced the subsequent anaerobic digestion process, which was demonstrated by the increase of accumulated biogas production. Compared with digesters fed with none irradiated sludge, the accumulated biogas production increased 44, 98, and 178 mL for digesters fed sludge irradiated at 2.48, 6.51, and 11.24 kGy, respectively. The results indicated that ?-irradiation pretreatment could effectively enhance anaerobic digestibility of sewage sludge, and correspondingly, could accelerate hydrolysis process, shorten sludge retention time of sludge anaerobic digestion process.

关键词: anaerobic digestibility     soluble chemical     cytoplasm     digestion process     soluble    

Experimental study on the temperature dependence of ultraviolet absorption cross-sections of sulfur dioxide

ZHANG Shiliang, ZHOU Jie, CHEN Xiaohu

《能源前沿(英文)》 2008年 第2卷 第2期   页码 183-186 doi: 10.1007/s11708-008-0025-2

摘要: The photoabsorption cross-sections of sulfur dioxide were measured in the spectral regions of 200–230 nm and 275–315 nm at 298–415 K, using a grating monochromator with a resolution of 0.2 nm. The discrete absorption cross-section is directly correlated with the number of quantum excited from the base state. The absorption cross-sections at the peaks of discrete bands decreased linearly with the increase of temperature, which corresponded to the decrease in the population of vibrational and rotational transitions from the base level to higher excitation levels. The absorption cross-section peaks decreased linearly when the temperature increased from 298 to 415 K, with relative drops of 74.0% and 75.8% at 200–230 nm and 275–315 nm, respectively. Another distinctive feature of sulfur dioxide absorption spectra in the above two spectral regions was the quasiperiodic structure of the absorption peaks, whose equal wavelength intervals were 1.53 nm and 1.95 nm, respectively. Red and blue shifts were not found at the absorption peak positions.

Effects of irradiation on chromium’s behavior in ferritic/martensitic FeCr alloy

Xinfu HE, Wen YANG, Zhehao QU, Sheng FAN

《能源前沿(英文)》 2009年 第3卷 第2期   页码 181-183 doi: 10.1007/s11708-009-0025-x

摘要: The effects of irradiation on chromium performance under different temperatures in Fe-20at%Cr were modeled by modified Marlowe code. Chromium precipitation was observed in FeCr alloy after irradiation; interstitial Chromium atoms are the preferred formation of mixed Fe-Cr dumbbells in the direction of<110>and<111>; interstitial chromium atoms congregated on {111} and {110} plane. The results are compared with experiment observations and are useful to understanding the irradiation performances of FeCr alloy.

关键词: irradiation     Fe-20at%Cr alloy     chromium segregation    

Removal of virus aerosols by the combination of filtration and UV-C irradiation

《环境科学与工程前沿(英文)》 2023年 第17卷 第3期 doi: 10.1007/s11783-023-1627-y

摘要:

● The removal of virus aerosols by filtration and UV-C irradiation was proposed.

关键词: Filtration system     UV-C irradiation     Virus aerosol     Public health     COVID-19    

Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿(英文)》 2020年 第14卷 第1期 doi: 10.1007/s11783-019-1192-6

摘要: • Long amplicon is more effective to test DNA damage induced by UV. • ATP in bacteria does not degrade instantly but does eventually after UV exposure. • After medium pressure UV exposure, ATP degraded faster. The efficacy of ultraviolet (UV) disinfection has been validated in numerous studies by using culture-based methods. However, the discovery of viable but non-culturable bacteria has necessitated the investigation of UV disinfection based on bacterial viability parameters. We used quantitative polymerase chain reaction (qPCR) to investigate DNA damage and evaluated adenosine triphosphate (ATP) to indicate bacterial viability. The results of qPCR effectively showed the DNA damage induced by UV when using longer gene amplicons, in that sufficiently long amplicons of both 16S and gadA indicated that the UV induced DNA damages. The copy concentrations of the long amplicons of 16S and gadA decreased by 2.38 log/mL and 1.88 log/mL, respectively, after exposure to 40 mJ/cm2 low-pressure UV. After UV exposure, the ATP level in the bacteria did not decrease instantly. Instead it decreased gradually at a rate that was positively related to the UV fluence. For low-pressure UV, this rate of decrease was slow, but for medium pressure UV, this rate of decrease was relatively high when the UV fluence reached 40 mJ/cm2. At the same UV fluence, the ATP level in the bacteria decreased at a faster rate after exposure to medium-pressure UV.

关键词: UV disinfection     DNA damage     qPCR     ATP    

chemicals from water through urethane functionalization of microfiltration membranes via electron beam irradiation

《环境科学与工程前沿(英文)》 2023年 第18卷 第4期 doi: 10.1007/s11783-024-1805-6

摘要:

● Urethane functionalities created on PES membranes via electron beam irradiation.

关键词: Surface functionalization     Electron beam irradiation     Microfiltration     Endocrine disrupting chemicals    

Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

《环境科学与工程前沿(英文)》 2022年 第16卷 第8期 doi: 10.1007/s11783-022-1521-z

摘要:

• UV/chlorine can effectively remove VBNC pathogens, ARGs and MGEs in reclaimed water.

关键词: UV/chlorine process     Pathogen     Antibiotic resistance genes     High-throughput qPCR     Reclaimed water    

Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

《环境科学与工程前沿(英文)》 2019年 第13卷 第2期 doi: 10.1007/s11783-019-1111-x

摘要:

UV can induce damages on mRNA consistently among different genes.

SOS response was more active after UV treatment.

Programmed cell death was not found to be more active after UV treatment.

关键词: UV disinfection     Viability     mRNA     SOS response     Programmed cell death    

标题 作者 时间 类型 操作

Effect of ultraviolet irradiation and chlorination on ampicillin-resistant

Yuchen PANG,Jingjing HUANG,Jinying XI,Hongying HU,Yun ZHU

期刊论文

Decomposition of aqueous chlorinated contaminants by UV irradiation with H

Eunsung KAN,Chang-Il KOH,Kyunghyuk LEE,Joonwun KANG

期刊论文

Factors influencing the photodegradation of

Bingbing XU, Zhonglin CHEN, Fei QI, Jimin SHEN, Fengchang WU

期刊论文

Ultraviolet exposure enhanced silicon direct bonding

Guanglan LIAO, Xuekun ZHANG, Xiaohui LIN, Canghai MA, Lei NIE, Tielin SHI,

期刊论文

Patterned wafer bonding using ultraviolet adhesive

Rui ZHUO, Guanglan LIAO, Wenliang LIU, Lei NIE, Tielin SHI

期刊论文

Effects of design parameters on performance and cost analysis of combined ultraviolet-biofilter systems

Can WANG, Jinying XI, Hongying HU, Insun KANG

期刊论文

Toward better understanding vacuum ultraviolet–iodide induced photolysis via hydrogen peroxide formation

期刊论文

Use of gamma-irradiation pretreatment for enhancement of anaerobic digestibility of sewage sludge

YUAN Shoujun, ZHENG Zheng, YU Xin, ZHAO Yongfu, MU Yanyan

期刊论文

Experimental study on the temperature dependence of ultraviolet absorption cross-sections of sulfur dioxide

ZHANG Shiliang, ZHOU Jie, CHEN Xiaohu

期刊论文

Effects of irradiation on chromium’s behavior in ferritic/martensitic FeCr alloy

Xinfu HE, Wen YANG, Zhehao QU, Sheng FAN

期刊论文

Removal of virus aerosols by the combination of filtration and UV-C irradiation

期刊论文

Bacterial inactivation, DNA damage, and faster ATP degradation induced by ultraviolet disinfection

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文

chemicals from water through urethane functionalization of microfiltration membranes via electron beam irradiation

期刊论文

Effect of the ultraviolet/chlorine process on microbial community structure, typical pathogens, and antibiotic

期刊论文

Using mRNA to investigate the effect of low-pressure ultraviolet disinfection on the viability of

Chao Yang, Wenjun Sun, Xiuwei Ao

期刊论文